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 Patents Issused in 2000 and Earlier
The following is a list of the patents awarded to SEH during 2000 and before. Each US patent's title will link to a full text of that patent on the United States Patent and Trademark Office web site.
US
5,306,939 |
Epitaxial Silicon Wafers for CMOS
Integrated Circuits |
4/26/94 |
Wijaranakula, Mitani |
US
5,406,905 |
Cast Dopant for Crystal Growing |
4/18/95 |
Colburn, Yemane-Berhane |
US
5,611,855 |
Method for manufacturing a
Calibration Wafer Having Microdefect-Free Layer of Precisely Predetermined Depth |
3/18/97 |
Wijaranakula |
US
5,629,216 |
Method for Producing
Semiconductor Wafers with Low Light Scattering Anomalies |
5/13/97 |
Wijaranakula |
US
5,637,282 |
Nitrogen Oxide Scrubbing with
Alkaline Peroxide Solution |
6/10/97 |
Gee, Osborne, Bomber, Pesklak,
Dick, Park, Yetter, Boyce |
US
5,641,354 |
Puller Cell |
6/24/97 |
Uchikawa, Sakauchi, Hirano (all
SEH-J) |
US
5,651,894 |
Water Purification System and
Method |
7/29/97 |
Boyce |
US
5,657,879 |
Combination Wafer Carrier and
Storage Device |
8/17/97 |
Anderson (Doug), Jordan |
US
5,685,906 |
Method & Apparatus for
configuring Epitaxial Reactor for Reduced Set-Up Time & Improved
Layer Quality |
11/11/97 |
Dietze,
Holman |
US
5,700,190 |
Flowhood Work Station with
Built-In Air Return |
12/23/97 |
Johnson (Roy), Wilkinson (Don) |
US
5,702,522 |
Method for Operating a Growing
Hall Containing Puller Cells |
12/30/97 |
Uchikawa, Sakauchi, Hirano (all
SEH-J) |
US
5,702,973 |
Method of Forming Epitaxial
Semiconductor Wafer for CMOS Integrated Circuits |
12/30/97 |
Wijaranakula |
US
5,730,770 |
Two Stage Air filter for Use with
Electronic Enclosures |
3/24/98 |
Greisz |
US
5,749,967 |
Puller Cell |
5/12/98 |
Uchikawa, Sakauchi, Hirano (all
SEH-J) |
US
5,764,353 |
Backside Damage Monitoring Method |
6/9/98 |
Tate (SEH-J), Brown, (Eva), Sato
(SEH-J) |
US
5,827,118 |
Clean Storage Unites |
10/27/98 |
Wilkinson (Don), Johnson (Roy) |
US
5,827,367 |
An Apparatus for Improving
Mechanical Strength of the Neck Section of CZ Silicon Crystal |
10/27/98 |
Tamura, Wijaranakula |
US
5,832,914 |
Ingot Trimming Method and
Apparatus |
11/10/98 |
Aydelott |
US
5,841,661 |
Wafer Image (ADS) Vision System
to Automated Dimensioning Equipment (ADE) Communication |
11/24/98 |
Buchanan, Paine,
Cann |
US
5,849,103 |
Method of Monitoring Fluid
Contamination |
12/15/98 |
Bennett, Zaro, Iizuka |
US
5,865,887 |
Apparatus & Method
for Improving Mechanical Strength of the Neck Section of CZ Silicon
Crystal |
2/2/99 |
Tamura, Wijaranakula |
US
5,872,017 |
In-Situ Epitaxial Passivation for
Resistivity Measurement |
2/16/99 |
Boydston, Mitchell (Dena) |
US
5,878,072 |
Laser Alignment Cross Hair |
3/2/99 |
Greisz |
US
5,891,242 |
Apparatus and Method for
Determining an Epitaxial Layer Thickness and Transition Width |
4/6/99 |
Pesklak, Colburn |
US
5,893,982 |
Prevention of Edge Stain in
Silicon Wafers by Oxygen Annealing |
4/13/99 |
Nakano, Woodling |
US
5,901,694 |
Counterweight for Silicon Ingot
Endcuts |
5/11/99 |
Aydelott |
US
5,902,394 |
Oscillating Crucible for
Stabilization of CZ Silicon Melt |
5/11/99 |
Burkhart (Curt), Colburn |
US
5,911,825 |
Low Oxygen Heater |
6/15/99 |
Iwasaki, Groat |
US
5,922,135 |
Method of Removing Residual Wax
From Silicon Wafer Polishing Plate |
7/13/99 |
Mistry |
US
5,935,301 |
Mist Separator Apparatus |
8/10/99 |
Baker (Jim) |
US
5,943,552 |
Schottky Metal Detection Method |
8/24/99 |
Koveshnikov, Mollenkopf |
US
5,961,713 |
Method for Manufacturing a Wafer
Having a Microdefect-Free Layer of Precisely Predetermined Depth |
10/5/99 |
Wijaranakula |
US
5,961,716 |
Diameter & Melt Level
Measurement Method & Apparatus Used in Automatically Controlled Crystal
Growth |
10/5/99 |
White (Barton), Vickery |
US
5,964,948 |
Exhaust Insert for Barrel-Type
Epitaxial Reactors |
10/12/99 |
Dietze,
Mitchell (Dena) |
US
5,968,277 |
Susceptor
Apparatus for Epi Deposition & Method for Reducing Slip formation
on Semiconductor Substrates |
10/19/99 |
Landin, Stevenson |
US
5,972,802 |
Prevention of Edge Stain in
Silicon Wafers by Ozone Dipping |
10/26/99 |
Nakano, Woodling |
US
5,976,245 |
CZ Crystal Growing System |
11/2/99 |
Aydelott |
US
5,983,907 |
Method of Drying Semiconductor
Wafers Using Hot Deionized Water and Infrared Drying |
11/16/99 |
Danh,
Nakano |
US
5,986,748 |
Dual Beam Alignment Device and
Method |
11/16/99 |
Greisz,
Miller (John) |
US
5,993,555 |
Apparatus and Process for Growing
Silicon Epitaxial Layer |
11/30/99 |
Hamilton (Todd) |
US
5,993,902 |
Si3N4
(Silicon Nitride) Coating of Exhaust Sleeve |
11/30/99 |
Heid |
US
5,999,252 |
Method for Marking Workpieces |
12/7/99 |
Greisz |
US
6,000,998 |
System for Calibrating Wafer
Edge-Grinder |
12/14/99 |
Anderson (D.T.) |
US
6,012,976 |
Multi-Piece Lathe Chuck for
Silicon Ingots |
1/11/00 |
Aydelott, Nice, Brown (Rick) |
US
6,013,319 |
Method and Apparatus for
Increasing Deposition Quality of a Chemical Vapor Deposition System |
1/11/00 |
Dietze |
US
6,014,886 |
Gauge Block Holder Apparatus |
1/18/00 |
Anderson, Jordan |
US
6,022,793 |
Silicon and Oxygen Ion
Co-Implantation for Metallic Gettering in Epitaxial Wafers |
2/8/00 |
Ravi, Wijaranakula, Tate |
US
6,027,569 |
Gas Injection Methods and Systems
for a LPCVD Furnace |
2/22/00 |
Brown (Pat) |
US
6,030,451 |
Two Camera Diameter Control
System with Diameter Control for Tracking Silicon Ingot Growth |
2/29/00 |
LaBrie,
Baba |
US
6,051,064 |
Apparatus for Weighing Crystals
during CZ Crystal Growing |
4/18/00 |
LaBrie |
US
6,055,293 |
Method for Identifying Desired
Features in a Crystal |
4/25/00 |
Secrest (Mark) |
US
6,058,947 |
Contamination Monitoring Cart |
5/9/00 |
Bennett, Zaro, Iizuka |
US
6,059,875 |
Method of Effecting Nitrogen
Doping in Czochralski Grown Silicon Crystal |
5/9/00 |
Kononchuk, Tamura,
Kirkland |
US
6,063,188 |
Crucible with Differentially
Expanding Release Mechanism |
5/16/00 |
Heid |
US
6,063,205 |
Use of H2O2
Solution as a Method of Post Lap Cleaning/Oxidation |
5/16/00 |
Cooper (Steve), Sato |
US
6,071,184 |
Fluid Deflecting Device for Use
in Work Piece Holder during a semiconductor Wafer Grinding Process |
6/6/00 |
Anderson (D.T.) |
US
6,083,092 |
Multi-Piece Lathe Chuck for
Silicon Ingots |
7/4/00 |
Aydelott, Nice, Brown (Rick) |
US
6,089,964 |
Grinding Wheel Shield for
Grinding Machine |
7/18/00 |
Adams (Craig) |
US
6,090,198 |
Method for Reducing Thermal Shock
in a Seed Crystal During Growth of a Crystalline Ingot |
7/18/00 |
Aydelott |
US
6,090,222 |
High Pressure Gas Cleaning Purge
of a Dry Process Vacuum Pump |
7/18/00 |
LaBrie,
Ivey (Kenneth) |
JP
2977521 |
Apparatus and Process for Growing
Silicon Epitaxial Layer |
9/10/99 |
Hamilton (Todd) |
US
6,102,977 |
Make-Up Air Handler and Method
for Supplying Boron-Free Outside Air to Clean Rooms |
8/15/00 |
Johnson (Roy P.) |
US
6,106,365 |
Method and Apparatus to Control
Mounting Pressure of Semiconductor Crystals |
8/22/00 |
Gessler |
US
6,106,611 |
Insulating and Warming Shield for
a Seed Crystal and Seed Chuck and Method for Using the Device |
8/22/00 |
Aydelott, Groat |
US
6,106,612 |
Level Detector and Method for
Detecting a Surface Level of a Material in a Container |
8/22/00 |
White (Barton) |
US
6,115,903 |
Purge Tube Removal and
Replacement |
9/12/00 |
Aydelott |
US
6,123,617 |
Clean Room Air Filtering System |
9/26/00 |
Johnson (Roy P.) |
US
6,128,967 |
Level Transmitter Connector |
10/10/00 |
Campbell |
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